Photochemicals, Solvents and Etchants
Electroplating
Plating Solutions
Photochemicals
Photoresists (Positive)
Photoresists (Negative)
Photoresists (Image Reversal)
Photoresists (Protective Coating)
Developers
Developers (MIC)
Developers (MIF, TMAH- based)
Remover
Adhesion Promoter
Anti- Reflective Coatings
Solvents
Etchants
Bases
Etching Mixtures
Electroplating
Plating Solutions
| Semiplate Sn 100 | 1L / 5L |
| Semiplate Au 100 AS | 1L / 5 |
| Semiplate Au 100 TL | 1L / 5 |
| Semiplate Ni 100 | 1L / 5 |
| Semiplate NiMn 100 | 1L / 5 |
| Semiplate In 100 | 1L / 5 |
| Semiplate Cu 100 | 1L / 5 |
| Semiplate Pd 200 | 1L / 5 |
| Semiplate Ag 100 | 1L / 5 |
Photochemicals
Photoresists (Positive)
| AZ 1505 PCN | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ 1512 HS PCN | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ 1514 H PCN | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ 1518 | 250ml / 500ml / 1L / 2.5L / 5L |
| AZ P4110 PCN | 3.78L |
| AZ 4533 PCN | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ P4903 PCN | 3.78L |
| AZ P4620 PCN | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ 4562 PCN | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ 7905 | 3.78L |
| AZ 3DT-102M- 15 | 250ml / 500ml / 1L |
| AZ 40XT 11D | 100ml / 250ml / 500ml / 1L / 2.5L /3.78L |
| AZ 12XT- 20PL- 10 PCN | 100ml / 250ml / 500ml / 1L / 2.5L /3.78L |
| AZ 12XT- 20PL- 15 PCN | 3.78L |
| AZ 10XT 520 cP PCN | 250ml / 500ml / 1L / 2.5L /3.78L |
| AZ 10XT 220cP NEW | 3.78L |
| PL 177 PCN | 3.78L |
| AZ ECI 3027 | 250ml |
| AZ ECI 3027 PCN | 500ml / 1L / 2.5L /3.78L |
| AZ ECI 3007 PCN | 500ml / 1L / 2.5L /3.78L |
| AZ TX 1311 | 3.78L |
| AZ MIR 701 11cP | 3.78L |
| AZ MIR 701 14cP PFOAfree | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ MIR 701 29cP PFOAfree | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ 4999 PCN | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ IPS 6090 | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ TFP 650 F5 | 3.78L |
| MC Dip Coating | 250ml / 500ml / 1L / 2.5L / 5L |
Photoresists (Negative)
| AZ 15nXT 450cps | 100ml / 250ml / 500ml / 1L / 2.5L /3.78L | |
| AZ 15nXT 115cps | 100ml / 250ml / 500ml / 1L / 2.5L /3.78L | |
| AZ 125nXT 10A | 100ml / 250ml / 500ml / 1L / 2.5L /3.78L | |
| AZ 125nXT 7A | 3.78L | |
| AZ LNR-003 | 250ml / 500ml / 1L / 2.5L | |
| AZ LNR-003 diluted | 250ml / 500ml / 1L / 2.5L | |
| AZ nLOF 2070 diluted // e-beam | 100ml / 250ml / 500ml / 1L / 2.5L / 5L | |
| AZ nLOF 2070 PCN | 100ml / 250ml / 500ml / 1L / 2.5L /3.78L | |
| AZ nLOF 2035 PCN | 100ml / 250ml / 500ml / 1L / 2.5L /3.78L | |
| AZ nLOF 2020 PCN | 100ml / 250ml / 500ml / 1L / 2.5L /3.78L | |
| AZ nLOF 5510 | 3.78L | |
Photoresists (Image Reversal)
| AZ 5209 E NEW | 3.78L |
| AZ 5214 E (EU) | 250ml |
| AZ 5214 E (JP) | 250ml / 500ml / 1L / 2.5L / 3.78L |
| TI xLift-X | 250ml / 500ml / 1L / 2.5L / 5L |
| TI Spray | 250ml / 500ml / 1L / 2.5L / 5L |
| TI 35 E | 250ml / 500ml / 1L / 2.5L / 5L |
| TI 35 ES-X | 250ml / 500ml / 1L / 2.5L / 5L |
Photoresists (Protective Coating)
| AZ 520 D | 250ml / 500ml / 1L / 2.5L / 3.78L / 5L |
| AZ P4K-AP Coating | 100ml / 250ml / 500ml / 1L / 2.5L / 3.78L |
Developers
| AZ 340 Developer | 5L |
| Developer K45 | 5L |
Developers (MIC)
| AZ Developer | 5L |
| AZ 303 Developer | 5L |
| AZ 351 B Developer | 5L |
| AZ 400 K Developer | 5L |
| AZ 400 K Developer 1:4 | 5L |
Developers (MIF, TMAH- based)
| AZ 326 MIF Developer | 5L |
| AZ 726 MIF Developer | 5L |
| AZ 2026 MIF Developer | 5L |
| AZ 2033 MIF Developer | 5L |
Remover
| TechniStrip D350 | 2.5L / 5L | |
| TechniStrip NI555 | 5L | |
| TechniStrip P1316 | 5L | |
| TechniStrip P1331 | 5L | |
| TechniStrip Micro D2 | 5L | |
| TechniStrip MLO 07 | 5L | |
| TechniStrip NF26 | 5L | |
| TechniStrip NF52 | 5L | |
| AZ 100 Remover | 5L | |
| AZ Remover 910 | 5L | |
| AZ Remover 920 | 5L | |
| TechniClean CA25 MOS | 5L | |
Adhesion Promoter
| TI PRIME | 250ml / 500ml / 1L / 2.5L / 5L |
| HMDS (VLSI) | 1L |
Anti- Reflective Coatings
| AZ Aquatar- VIII- A45 | 250ml / 500ml / 1L / 2.5L / 3.78L |
| AZ Barli II-90 | 3.78L |
| AZ Barli II-200 | 250ml / 500ml / 1L / 2.5L / 3.78L |
Solvents
| MC DMSO (ULSI) | 2.5L |
| AZ EBR Solvent | 1L / 2.5L |
| AZ EBR 70/30 | 1L / 2.5L |
| TF Acetone (VLSI) | 2.5L / 5L |
| TF Acetone (ULSI) | 5L |
| MC Acetone (ULSI) | 2.5L |
| MC MEK (ULSI) | 2.5L |
| MC Spray Thinner MEK | 1L / 2.5L / 5L |
| MC Spray Thinner PGMEA | 1L / 2.5L / 5L |
| Cyclopentanon (ULSI) | 2.5L |
| TF Isopropanol (VLSI) | 2.5L / 5L |
| MC Isopropanol (ULSI) | 2.5L |
| MIBK (VLSI) | 2.5L |
| Methanol (ULSI) | 2.5L |
| Butyl Acetate (VLSI) | 2.5L / 5L |
| Ethyl Acetate (VLSI) | 2.5L |
Etchants
| Hydrogen Peroxide (30%) | 2.5L |
| Acetic Acid (100%) (VLSI) | 2.5L |
| Hydrofluoric Acid (1%) (VLSI) | 2.5L |
| Hydrofluoric Acid (10%) (VLSI) | 2.5L |
| Hydrofluoric Acid (50%) (VLSI) | 2.5L |
| Hydrochloric Acid (37%) (ULSI) | 2.5L |
| Sulphuric Acid (96%) (VLSI) | 2.5L |
| Nitric Acid (69,5%) (VLSI) | 2.5L |
| Phosphoric Acid (85%) (VLSI) | 2.5L |
Bases
| Ammonia Solution (28-30%) | 5L |
| KOH (44%) (VLSI) | 2.5L |
| TMAH (25%) (VLSI) | 2.5L |
Etching Mixtures
| TiW etch 200 | 1L / 5L |
| TiW etch 100 | 1L / 5L |
| BOE 7:1 (VLSI) | 2.5L |
| BOE 7:1 with surfactant (VLSI) | 2.5L |
| TechniEtch CN10 Conc.MOS | 2.5L |
| TechniEtch ACI 2 (VLSI) | 1L / 5L |
| TechniEtch Al80MOS | 2.5L |
| TechniEtch TBR 19 Conc.MOS | 2.5L |
| TechniEtch Cr01 (VLSI) | 2.5L |
| Cu etch 100 Unit A | 1L / 5L |
| Cu etch 100 Unit B | 1L / 5L |
| NB Cu etch 150 Unit A | 1L / 5L |
| NB Cu etch 150 Unit A | 1L / 5L |
| Cu etch 200 UBM | 1L / 5L |
| Au etch 200 | 1L / 5L |
| Cr etch 200 | 1L / 5L |
| Cr etch 210 | 1L / 5L |
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